AkzoNobel HPMO Reveals Novel Hiperflo Bubbler
27 November 2009
On the occasion of the 8th International Conference on Nitride Semiconductors (ICNS) on Jeju Island, S. Korea, AkzoNobel HPMO revealed a novel bubbler type for liquid MO-sources.
This novel bubbler, named Hiperflo, enables via its special design a higher gas saturation level, superior vapour stability and more complete source utilization. This is especially advantageous for lower vapour pressure MO-sources such as triethyl gallium (TEGa), as has been confirmed by the experience of the first users of this new bubbler.